CMP Slurry Filters
CMP SLURRY FILTERChemical Mechanical Planarization (CMP) is a polishing process used to manufacture wafers for the semiconductor industry. It requires the use of a polishing tool and polishing slurry. Our QXL Filter element is specifically designed for CMP Slurry applications. For either (1) loop or recirculation filtration and 2) point-of-use(POU) filtration. The QXL Series filters combine the best features of depth filters (ability to remove a range of particle sizes due to graded pore structure, stable media configuration) with the advantages of pleated filters (high surface area for improved flow rates, lower pressure drops and longer on-stream life). The QXL Series filters combine the best features of depth filters (ability to remove a range of particle sizes due to graded pore structure, stable media configuration) with the advantages of pleated filters (high surface area for improved flow rates, lower pressure drops and longer on-stream life). Filter Features–Benefits• Hybrid pleated depth construction combines graded pore structure with high surface area. Filter SpecificationsConstruction material: Polypropylene
Dimensions and Operating ParametersNominal lengths: 9.75’’, 10’’, 20’’, 30’’, 40’’
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